Control of Insertion Loss in Substrate-Integrated Waveguide Band-Pass Filter Using New Tapered Waveguide Iris Technique


Department of Electronics and Communication Engineering, NSHM Knowledge Campus, Durgapur, West Bengal, India


Department of Electronics and Communication Engineering, Dr. B C Roy Engineering College, Durgapur, West Bengal, India


Department of Electrical Engineering, National Institute of Technology, Durgapur, West Bengal, India

ELECTRICA 2024; 24: 256-264
DOI: 10.5152/electrica.2024.23019
Read: 886 Downloads: 158 Published: 30 January 2024

An approach to obtain effective control of insertion loss (IL) in wideband substrate-integrated waveguide (SIW) band-pass filter with several tapered iris configurations is presented in this paper. Several iris configurations and iris parameters have been minutely studied and effective postulates have been provided for accurate design of filters with low IL throughout the transmission bandwidth. Basic structure is designed over a substrate with dielectric constant 3.2 and material thickness of 30 mils. The structures are then successfully modified into a band-pass filter with its pass band in Ku bands with minimal IL using waveguide iris method. The technique effectively serves the purpose to achieve greater control over the IL and isolation. Maximum IL of 2 dB is reduced by 1.5 dB and close to 0.5 dB IL is obtained in the final configuration using the tapering technique. Proposed techniques are supported with theoretical explanations. All designs are fabricated, and measured results are found to validate the concept produced in this paper. The study provides a direct solution to the SIW Iris filter design engineers considering all major parameters necessary for industrial/scientific productions.

Cite this article as: J. Kundu Paul, S. Moitra and P. Sarathee Bhowmik, "Control of insertion loss in substrate-integrated waveguide (SIW) band-pass filter using new tapered waveguide iris technique," Electrica, 24(1), 256-264, 2024.

EISSN 2619-9831