ELECTRICA
Original Article

Ultra-narrow Band Fano Resonance-Based All-Dielectric Optical Absorber Using Silica–Silicon Metamaterials

1.

Department of Electrical Engineering, Aliabad Katoul Branch, Islamic Azad University, Aliabad Katoul, Iran

2.

Energy Research Center, Aliabad Katoul Branch, Islamic Azad University, Aliabad Katoul, Iran

3.

Nano Research Lab, Lahijan Branch, Islamic Azad University, Lahijan, Iran

4.

Department of Physics, Aliabad Katoul Branch, Islamic Azad University, Aliabad Katoul, Iran

ELECTRICA 2024; 24: 357-366
DOI: 10.5152/electrica.2024.23107
Read: 304 Downloads: 174 Published: 18 March 2024

Abstract: In this paper, an optical reflector is designed based on an all-dielectric metamaterial comprising silicon double bars with bent arms positioned on the surface of a silica layer. The proposed structure generates high-quality factor Fano resonance peaks within the visible spectrum, facilitated by the structural asymmetry introduced into the top layer of the metamaterial, i.e., the bar pairs. The use of dielectric materials instead of metal has resulted in lower plasmonic power loss and ultra-high quality factor peaks in the desired range. Simulation results show that the central wavelength, spectral width, and amplitude of the Fano resonance peaks can be adjusted by controlling the geometrical characteristics of the structure. Notably, an ultra-narrow Fano resonance peak of 0.26 nm at 682.78 nm wavelength has been achieved through the geometrical manipulation of the silicon bar pairs. Consequently, the proposed structure holds potential for applications in a variety of optical devices such as ultra-narrow band filters and high-resolution sensors.

Cite this article as: A. Akbar Mashkour, A. Koochaki, A. Abdolahzadeh Ziabari and A. Sadat Naeimi, “Ultra-narrow band fano resonance based all-dielectric optical absorber using silica-silicon metamaterials,” Electrica, 24(2), 357-366, 2024.

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EISSN 2619-9831